Gas ring for a plasma processing apparatus



This application contains subject matter related to the followingco-pending U.S. design patent applications:

Application Ser. No. 29/635,287, filed herewith and entitled “ElectrodePlate for a Plasma Processing Apparatus”;

Application Ser. No. 29/635,292, filed herewith and entitled “ElectrodeCover for a Plasma Processing Apparatus”; and

Application Ser. No. 29/635,296, filed herewith and entitled “ElectrodePlate Peripheral Ring for a Plasma Processing Apparatus”.

FIG. 1 is a front and bottom perspective view of a gas ring for a plasmaprocessing apparatus according to the design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a left side elevational view thereof;

FIG. 4 is a right side elevational view thereof;

FIG. 5 is a top plan view thereof;

FIG. 6 is a bottom plan view thereof;

FIG. 7 is a rear elevational view thereof;

FIG. 8 is a cross-sectional view taken along line 8-8 of FIG. 2; and,

FIG. 9 is an enlarged view of the portion shown in BOX 9 in FIG. 8.

The broken lines in FIG. 8 show the boundary of the enlarged portionillustrated in FIG. 9 and form no part of the claimed design.

CLAIM The ornamental design for a gas ring for a plasma processingapparatus, as shown and described.